Jon Ihlefeld holds a dual appointment as Professor of Materials Science and Engineering and Professor of Electrical and Computer Engineering at the University of Virginia, in Charlottesville, Virginia. He received a B.S. degree in Materials Engineering from Iowa State University and M.M.S.E. and Ph.D. degrees from North Carolina State University. He has been a professor at the University of Virginia since 2017. Prior, he was a Distinguished Member of the Technical Staff at Sandia National Laboratories in Albuquerque, New Mexico. He has authored or co-authored over 130 peer-reviewed publications and holds 16 U.S. patents, most of which are on the topic of ferroelectric thin film technologies. He has received two R&D 100 awards, is a Senior Member of the IEEE, received a DARPA Young Investigator Award, and is a recipient of the IEEE’s Ferroelectrics Young Investigator Award. He is a past Chair of the Electronics Division of ACerS and is a member of the Electronics, Basic Science, and Glass and Optical Materials Divisions. He has served as a General Chair for the ACerS Electronic Materials and Applications meeting on two occasions and has received the Society’s Richard M. Fulrath award. His primary research focus is on the study of scalable ferroelectrics for next generation non-volatile computer memory. He directs additional efforts in high entropy oxides for environmental barrier coatings, solid-state ionic conductors for energy storage, and dielectric materials for high temperature electronics.