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New NIST standard to improve low-k film production

By / December 29, 2008

NIST has developed a method to measure the toughness (i.e., resistance to fracture) of low-k insulating films found in high-performance ICs. As with other NIST efforts, the technique is aimed at setting standards and testing methodology that will improve reliability and manufacturability. NIST notes, however, that unlike some of new standards that come out of…

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