Abstract:
Electronic and mechanical properties that control the function of ceramic devices, like capacitors and sensors, are highly dependent on the structure and chemistry of grains, grain boundaries, and the subsequently formed grain boundary network. The atomic structure, bonding configuration, defect distribution, segregation behavior of these boundaries, and the overall microstructure of the system are altered by material processing techniques. Developing a fundamental understanding of the effect of processing techniques on modifying these internal interfaces, and in turn, impacting the microstructure of ceramic materials is needed in order to tailor their properties and optimize their application in device technology.
This symposium explores fundamental research into the modifications of internal interfacial structure and composition as well as microstructure evolution in functional materials as it relates to processing techniques. These processing techniques include sintering, electric fields, high temperature and cryogenic application, and gas environment.
Lead Organizers:
James Wollmershauser, U.S. Naval Research Laboratory, james.a.wollmershauser.civ@us.navy.mil
Edward Gorzkowski, US Naval Research Laboratory, USA, edward.p.gorzkowski.civ@us.navy.mil
Amanda Krause, Carnegie Mellon University, USA, amandakr@andrew.cmu.edu
Hadas Sternlicht, Pennsylvania State University, USA, hxs5692@psu.edu
Proposed Sessions/Topics:
Sponsored By
